Metallurgic Wafer IC Microscope MX-500-6R – Caltex Digital Microscopes

New Model !!! MX-500-6R

Flexible, powerful, reliable metallugic wafer IC inspection microscope with excellent 1080p HD imaging performance and measurement

High power long working distance objective lenses of 5x, 10x, 20x, 50x. (100x optional) and 10x/22 eye pieces provide excellent high resolution image performance to meet your micron level inspection needs.

MX-500 series metallurgic microscope is designed as a flexible, ergonomic, reliable, day-to-day inspection microscope for metallurgic, wafer, IC and semiconductor.

Coupled with bright field, dark field, oblique, polarizing and DIC different interference illumination for enhancing the fine features on your samples.

Integrated with latest 1080p HD camera or digital USB microscope camera for image capture and measurement.

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Overview

High power wafer IC inspection microscope for micron level
Metallurgic microscope
5x, 10x, 20x, 50x high power long work distance objective lenses
DIC, polarizing, bright field & oblique illumination
Eye pieces inspection and 1080p HD camera viewing on LCD at the same time
Precision movement of XY stage 6″x6″ travel
Fine focus control

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Key Features

Ergonomic design to reduce work fatigue.
Flexible and expandable modular design.
Integrated bright field, dark field, oblique, polarizing, and DIC differential interference illumination are standard. Optional transmitted lighting.
XY stage travel 158mm x 158mm (6.22″ x 6.22″) with fine knob control for precision positioning of wafer IC & metallurgraphy.
Long working distance high power objective lenses designed with semi-apochromatic technology.
5x 10x, 20x, 50x included. 100x optional.
1080p HD camera or digital USB microscope camera on Trinocular port for high definition image capture and measurement.

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Applications

Wafer IC inspection microscope in semiconductor
Industrial metallurgic analysis
High power long working distance inspection microscope

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Application Images

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MX-500-6R Specifications

Model	MX500-6R	MX500-6RT
Optical system	Infinity color corrected optical system
Eyepiece	High eyepoint plan eyepiece PL10X/22
Objective Lenses	LMPL-BD infinity LWD metallurgical objective (both brightfield and darkfield available) 5X, 10X, 20X, 50X, Optional: 100X.
Optical Magnifications	50x, 100x, 200x, 500x, Optional 1,000x
Viewing head	Erect image, 25° gemel trinocular, reflect rate, binocular : trinocular = 100:0 or 0:100
Nosepiece	Reversed quintuple nosepiece, both brightfield and darkfield available, with DIC slot.
Stage	6” three ply mechanical stage, moving range 158 x 158mm, (6.22″ x 6.22″) glass stage, right hand position X & Y moving wheel with clutch handle for faster movement	6” three ply mechanical stage, reflected moving range 158 x 158mm (6.22′ x 6.22″0 Transmission moving range: 100 x 100mm, glass stage, right hand position X & Y moving wheel with clutch handle for faster movement
Body	Coaxial coarse and fine focus system, Coarse adjustment range 33 mm, precision of fine adjustment: 0.001mm, with coarse adjustment stop and tension adjustment. Built-in wide voltage 90V-240V, single power supply output.	Coaxial coarse and fine focus system, Coarse adjustment range 33 mm, precision of fine adjustment: 0.001mm, with coarse adjustment stop and tension adjustment. Built-in wide voltage 90V-240V, dual power supply output.
Reflective illumination System	With iris diaphragm and aperture diaphragm, both centers adjustable, with filter slot and polarizing device slot, switch rod with oblique lighting. 12V100W halogen bulb, light intensity continuously adjustable.
Polarization	Polarizer and analyzer
Illumination Methods	Bright field/Dark field/polarizing/DIC
Additional Illumination Method	NA	Transmission light
Transmission illumination system	NA	Single high-power 5W LED, white, light intensity continuously adjustable. N.A. 0.5 condenser with iris aperture diaphragm